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XEFORM®

Nanostructured Nickel Gold for Semiconductor Test & Electromechanical Contacts
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Nanocrystalline grain structure: 10–20 nm grain size drives yield strength to 1.5–2.0 GPa while maintaining a 130 GPa elastic modulus

Industry-leading elastic stored energy: Yield/modulus ratio of 1.1–1.5%, outperforming Cu-Be alloys (1.0%) — the key figure of merit for spring contact design

Gold grain boundary segregation: Au concentrates at grain boundaries, preserving ~10 µΩ·cm conductivity and preventing grain growth at elevated temperature

Two alloy compositions:

  • Ni-1.2 at% Au: 1.5 GPa yield strength, 1.15% elastic stored energy; optimal balance of strength, conductivity, and ductility
  • Ni-3.0 at% Au: 2.0 GPa yield strength, 1.54% elastic stored energy; trading some ductility for maximum strength in demanding geometries

2× the fatigue life of Cu-Be: Fatigue limit exceeding 1 GPa, confirmed at over one million cantilever bend cycles with no cracking

Thick electroform capability: Crack-free, void-free deposits to 400 µm in a single electroforming step

Process-ready deposit characteristics: Slightly tensile, low-stress plating produces dense, uniform deposits with consistent Au distribution batch to batch

    Nickel Gold tensile strength
      XRD Spectra of Nickel Gold

        Unmatched spring performance: High yield strength and optimal elastic modulus deliver consistent contact force across millions of test cycles

        Next-generation miniaturization: Enables LIGA-based electroforming at pitches unreachable by conventional stamping or machining

        Near-nickel conductivity: Carries chip test current without excessive heat, maintaining signal integrity throughout testing

        Enhanced Reliability: Thermally stable to 400°C, preserving mechanical and electrical properties under continuous use

        Precious metal compatible: Accepts gold and noble metal top coats for extended low contact resistance over probe life

        Lower total cost of ownership: Wafer-scale manufacturing eliminates the labor and yield losses of individual contact assembly

        Transform Your Products With XEFORM

        Wafer-scale electroforming: plates directly on silicon or PCB substrates with no individual handling required

        Plating thickness: 0.1 µm to 400 µm

        Production format: rack plating

        Consistent alloy uniformity: stable, uniform Au distribution across plated parts, compatible for complex geometries

        Application engineering support: pilot-scale sampling, process optimization, and on-site production support available

        Semiconductor Test

        • LIGA-electroformed probe cards
        • High-temperature test environments
        • Long-service probe fixtures

        Electrical Connectors

        • Spring contact beams
        • Connector interfaces
        • Reinforcement coating over lower-cost substrates

        Advanced Electromechanical

        • MEMS and precision spring elements
        • Quantum compute electrical contacts

        REACH compliant: no significantly hazardous materials, simplifying regulatory compliance globally

        Additive process efficiency: material deposited only where needed, generating less waste than stamping or machining

        Extended service life: fatigue resistance and thermal stability reduce probe replacement frequency and material consumption

        Cyanide-free chemistry: low hazard bath composition supports ESG and sustainability commitments

        Contact Us

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